8-Inch SiC抵抗加熱式デュアルヒーター単結晶成長炉
説明
レビュー
8-Inch 結晶成長装置は、高品質の4H-N型シリコンカーバイド結晶成長用に設計された先進的なソリューションです。抵抗加熱技術と精密な温度場制御を統合し、結晶製造における高効率と均一性を実現します。
装置の技術パラメーター:
System |
Item |
Specification |
Power Supply |
|
3-phase 380V 50Hz |
Vacuum Chamber |
Diameter × Height |
900mm × 1100mm |
|
Rated Power |
30kW, 50kW |
|
Rated Input Current |
130A |
High Precision 3-Phase AC Power Supply |
Rated Input Voltage |
3-phase 380VAC, 50Hz |
|
Rated Output I Current & Voltage |
1443A, 12V |
|
Rated Output II Current & Voltage |
1519A, 19V |
Vacuum System |
Ultimate Vacuum |
Chamber ultimate vacuum < 1 × 10⁻³ Pa |
|
System Holding Pressure |
Room temperature furnace, leak rate < 10 Pa within 12h |
Heating Temperature |
Maximum Temperature |
2400°C |
Temperature Measurement |
Range |
1000–3000°C |
Gas System |
Gas Supply Lines |
2–Ar, N₂ |
|
Control Accuracy |
≤ ±2% |
Pressure Control System
|
Pressure Range |
50 Pa ~ 80 kPa |
|
Control Accuracy (50Pa ≤ P ≤ 500Pa) |
≤ ±5 Pa |
Temperature Control System
|
Control Mode |
Power control, accuracy ±20W |
|
Control Range |
1000–2500°C |
|
Control Accuracy |
±5°C |
Water Cooling System |
Inlet Water Pressure |
>0.3 MPa (design pressure 0.5 MPa) |
|
Inlet Water Temperature |
25°C ± 1°C |
|
Outlet Water Temperature |
<40°C |